In thin-film deposition processes such as evaporation or directional PVD, the spatial distribution of deposited material is often approximated using a cosine-law model.
This repository provides a 2D cosine-law deposition simulation tool for estimating relative thickness (or flux) distributions on a substrate based on simple geometrical assumptions.
The tool is intended as a baseline model for quick evaluation of deposition uniformity before detailed simulation or experimental validation.
All simulation parameters are defined in a CSV configuration file, enabling repeatable and code-independent parametric studies.
- Main simulation script for 2D cosine-law deposition map
- Reads all parameters from
settings.csv - Generates numerical results and plots automatically
- Configuration file defining geometry, model parameters, and output settings
- No modification of the source code is required
- Place
2D cosine law simulation.pyin a directory - Place
settings.csvin the same directory - Edit parameters in
settings.csvas needed - Run the script
The deposition source is approximated as a point source located at height H above the substrate.
For each substrate position x:
-
Distance
r = √( H² + (x − x₀)² ) -
Incident angle
cosθ = H / r -
Relative intensity
I(x) ∝ (cosθ)ⁿ × (1 / r²) (optional)
where n is an empirical cosine exponent and x₀ is the lateral source offset.
This tool provides relative distributions, not absolute thickness values.
The following conventions are used in this repository:
- All length units are in millimeters (mm)
- Angles are handled implicitly through geometry
- Substrate region is defined symmetrically as ±
substrate_half_width_mm - Parameter values are read as strings and internally cast to numeric types
| Key | Description |
|---|---|
H_mm |
Source-to-substrate distance |
x_min_mm, x_max_mm |
Calculation range |
dx_mm |
Spatial resolution |
x_source_offset_mm |
Lateral source offset |
cosine_n |
Cosine-law exponent |
include_r2 |
Enable 1 / r² attenuation |
normalize_to_peak |
Normalize peak intensity to 1 |
scale_factor |
Scaling factor after normalization |
substrate_half_width_mm |
Half-width of substrate |
output_dir |
Output directory name |
output_basename |
Output file prefix |
- Early-stage process window exploration
- Sensitivity studies for source height or offset
- Comparison of cosine exponent (n) effects
- Pre-evaluation of thickness uniformity
- Educational or conceptual demonstrations of cosine-law deposition
settings.csvdefines all simulation parameters
Generated files are saved to the specified output directory:
-
<basename>.csvx_mm, intensity_raw, intensity_scaled
-
<basename>_metrics.csv- mean, min, max, peak-to-peak / mean, sigma / mean
-
<basename>.png- 2D deposition map plot
Original input files are not modified.
- Point-source approximation
- No re-emission, scattering, or plasma interactions
- Cosine exponent (n) is empirical
For quantitative prediction or equipment design, more advanced simulations or experimental validation are required.
- 1D cosine law simulation
A 1D cosine-law deposition simulation tool for estimating relative thickness or flux distributions using point-source geometry.